Thickness Uniformity of Large Area PZT Films Formed by Aerosol Deposition

Abstract

PZT films were deposited on 4 inch silicon wafer substrate by aerosol deposition, based on room temperature impact consolidation (RTIC). A nozzle that blowed out aerosol beam scanned the wafer. The film thickness was evaluated through the measurements with step height of masked edges. The aerosol deposited films showed relatively good uniformity of thickness of 1.4%. The surface roughness was Ra 59 nm.