Why tunneling FETs don't work, and how to fix it

S. Agarwal, E. Yablonovitch
{"title":"Why tunneling FETs don't work, and how to fix it","authors":"S. Agarwal, E. Yablonovitch","doi":"10.1109/E3S.2013.6705868","DOIUrl":null,"url":null,"abstract":"To date, TFET results have been unsatisfying. The best reported subthreshold swings have been measured at a current density of around a nA/um and get significantly worse as the current increases. In order to achieve a better performance, there are fundamental design issues that need to be engineered. We can understand these issues by analyzing the three types of devices shown in Fig 1. The voltage required to operate a TFET can be given by: V<sub>DD</sub> = V<sub>SS</sub> × Log(I<sub>on</sub> /I<sub>off</sub>)+ V<sub>OV</sub>. V<sub>SS</sub> is the subthreshold swing and V<sub>OV</sub> is the overdrive voltage needed to achieve the desired on-current after threshold. V<sub>OV</sub> will be determined by the device geometry as shown in Fig 2 [1]. Introducing quantum confinement in the direction of tunneling increases the conductance by 1-2 orders of magnitude at low voltage. V<sub>SS</sub> is given by the following model [2]: SS = 1/ η<sub>el</sub> × (1/S<sub>Barrier</sub> + η<sub>conf</sub>/S<sub>DOS</sub>)<sup>-1</sup> (1) η<sub>el</sub> is the electrostatic gate efficiency. η<sub>conf</sub> is the quantum confinement efficiency and comes from energy level shifts that occur when the quantum well shape changes with bias. S<sub>Barrier</sub> represents the steepness in mV/decade that comes from changing the thickness of the tunneling barrier. S<sub>DOS</sub> is the steepness of the joint density of states (DOS) and represents the rate at which the joint DOS fall off as the band edges are misaligned.","PeriodicalId":231837,"journal":{"name":"2013 Third Berkeley Symposium on Energy Efficient Electronic Systems (E3S)","volume":"69 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2013-10-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2013 Third Berkeley Symposium on Energy Efficient Electronic Systems (E3S)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/E3S.2013.6705868","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1

Abstract

To date, TFET results have been unsatisfying. The best reported subthreshold swings have been measured at a current density of around a nA/um and get significantly worse as the current increases. In order to achieve a better performance, there are fundamental design issues that need to be engineered. We can understand these issues by analyzing the three types of devices shown in Fig 1. The voltage required to operate a TFET can be given by: VDD = VSS × Log(Ion /Ioff)+ VOV. VSS is the subthreshold swing and VOV is the overdrive voltage needed to achieve the desired on-current after threshold. VOV will be determined by the device geometry as shown in Fig 2 [1]. Introducing quantum confinement in the direction of tunneling increases the conductance by 1-2 orders of magnitude at low voltage. VSS is given by the following model [2]: SS = 1/ ηel × (1/SBarrier + ηconf/SDOS)-1 (1) ηel is the electrostatic gate efficiency. ηconf is the quantum confinement efficiency and comes from energy level shifts that occur when the quantum well shape changes with bias. SBarrier represents the steepness in mV/decade that comes from changing the thickness of the tunneling barrier. SDOS is the steepness of the joint density of states (DOS) and represents the rate at which the joint DOS fall off as the band edges are misaligned.
为什么隧道效应晶体管不工作,如何解决它
迄今为止,TFET的结果并不令人满意。最好的亚阈值波动是在电流密度约为1 nA/um时测量到的,并且随着电流的增加而变得明显更糟。为了获得更好的性能,需要设计一些基本的设计问题。我们可以通过分析图1所示的三种类型的设备来理解这些问题。工作TFET所需的电压可以由:VDD = VSS × Log(Ion /Ioff)+ VOV给出。VSS是亚阈值摆幅,VOV是达到阈值后所需导通电流所需的超速电压。VOV将由器件几何形状决定,如图2[1]所示。在低电压下,在隧穿方向上引入量子约束使电导率提高了1-2个数量级。VSS由以下模型给出[2]:SS = 1/ ηel × (1/SBarrier + ηconf/SDOS)-1 (1) ηel为静电栅极效率。ηconf是量子约束效率,来自于量子阱形状随偏置变化时发生的能级位移。SBarrier表示陡峭度,单位为mV/ 10年,它来自于隧道势垒厚度的改变。SDOS是关节状态密度(DOS)的陡度,表示当带边缘不对齐时关节状态密度下降的速率。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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