Evaluation of /spl delta/-layer depth profiles detected on beveled semiconductor structures by micro Raman spectroscopy

B. Rheinlander, R. Srnánek, J. Kováč
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Abstract

The theoretical evaluation of the Raman intensities ratio of LO and TO phonons along the beveled GaAs structure containing Si /spl delta/-doped layer was performed. Excellent agreement with measured spectra was obtained.
用微拉曼光谱评价斜面半导体结构上的/spl δ /层深度分布
对含有Si /spl δ /掺杂层的倾斜GaAs结构上LO声子和TO声子的拉曼强度比进行了理论评价。所得结果与实测光谱吻合良好。
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