Formation of fine pitch solder bumps on polytetrafluoroethylene printed circuit board using dry film photoresist

Jung-Sub Lee, Kun-Mo Chu, Hyo-Hoon Park, D. Jeon
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Abstract

We demonstrated the applicability of dry film photoresists (DFR) in photolithography process for fine pitch bumping on the polytetrafluoroethylene (PTFE/Teflon/spl reg/) printed circuit board (PCB). The copper lines were formed with 100/spl mu/m width and 18/spl mu/m thickness on the PTFE test board, and varying the gaps between two copper lines in a range of 100-200/spl mu/m. The DFRs of 15/spl mu/m thickness were laminated by hot roll laminator, by varying laminating temperature from 100/spl deg/C to 150/spl deg/C and laminating speed. We found the optimum process of DFR lamination on PTFE PCB and accomplished the formation of indium solder bumps. The optimum lamination condition was temperature of 150/spl deg/C and speed of about 0.63cm/s. And the smallest size of indium solder bump was diameter of 50/spl mu/m with pitch of 100/spl mu/m.
用干膜光刻胶在聚四氟乙烯印刷电路板上形成细间距焊料凸点
我们展示了干膜光刻胶(DFR)在聚四氟乙烯(PTFE/Teflon/spl reg/)印刷电路板(PCB)上的光刻工艺中的适用性。在聚四氟乙烯试验板上形成宽度为100/spl亩/米、厚度为18/spl亩/米的铜线,并在100-200/spl亩/米范围内改变两条铜线之间的间隙。采用热轧复合机对厚度为15/spl mu/m的DFRs进行复合,通过改变复合温度(100 ~ 150/spl℃)和复合速度进行复合。找到了在聚四氟乙烯(PTFE)印制电路板上贴合DFR的最佳工艺,并完成了铟焊料凸点的形成。最佳层合温度为150℃/spl℃,层合速度为0.63cm/s。铟焊点的最小尺寸为直径50/spl mu/m,节距100/spl mu/m。
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