{"title":"BGaN back barrier engineering on E-mode T-gate double heterostructure HEMT for high RF applications","authors":"Megha Sharma, R. Chaujar","doi":"10.1109/RFM56185.2022.10065031","DOIUrl":null,"url":null,"abstract":"This research focuses on improving the draincurrent and radio-frequency properties of a T-gate E-mode AlInN/GaN HEMT with a BGaN back barrier. The results indicate that the boron gallium nitride back barrier may restrict the two-dimensional electron gas (2DEG) in the channel region and efficiently suppress the short channel effects. The BGaN back barrier HEMT with just a 2% B-component greatly improves the device’s analog and RF performance over a normal GaN buffer HEMT such as transconductance (0.15 S), intrinsic gain, early voltage (4.24 V), cut-off frequency (141 GHz) GFP (356 GHz), GTFP (4.6 THz), and transconductance frequency product (6.5 THz). Therefore, the device with a BGaN back barrier has considerable potential for use in applications requiring extremely linear devices that operate at high frequencies and high gain powers.","PeriodicalId":171480,"journal":{"name":"2022 IEEE International RF and Microwave Conference (RFM)","volume":"144 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2022-12-19","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2022 IEEE International RF and Microwave Conference (RFM)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/RFM56185.2022.10065031","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
This research focuses on improving the draincurrent and radio-frequency properties of a T-gate E-mode AlInN/GaN HEMT with a BGaN back barrier. The results indicate that the boron gallium nitride back barrier may restrict the two-dimensional electron gas (2DEG) in the channel region and efficiently suppress the short channel effects. The BGaN back barrier HEMT with just a 2% B-component greatly improves the device’s analog and RF performance over a normal GaN buffer HEMT such as transconductance (0.15 S), intrinsic gain, early voltage (4.24 V), cut-off frequency (141 GHz) GFP (356 GHz), GTFP (4.6 THz), and transconductance frequency product (6.5 THz). Therefore, the device with a BGaN back barrier has considerable potential for use in applications requiring extremely linear devices that operate at high frequencies and high gain powers.