BGaN back barrier engineering on E-mode T-gate double heterostructure HEMT for high RF applications

Megha Sharma, R. Chaujar
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Abstract

This research focuses on improving the draincurrent and radio-frequency properties of a T-gate E-mode AlInN/GaN HEMT with a BGaN back barrier. The results indicate that the boron gallium nitride back barrier may restrict the two-dimensional electron gas (2DEG) in the channel region and efficiently suppress the short channel effects. The BGaN back barrier HEMT with just a 2% B-component greatly improves the device’s analog and RF performance over a normal GaN buffer HEMT such as transconductance (0.15 S), intrinsic gain, early voltage (4.24 V), cut-off frequency (141 GHz) GFP (356 GHz), GTFP (4.6 THz), and transconductance frequency product (6.5 THz). Therefore, the device with a BGaN back barrier has considerable potential for use in applications requiring extremely linear devices that operate at high frequencies and high gain powers.
高射频应用中e模t栅双异质结构HEMT的BGaN背垒工程
本研究的重点是改善具有BGaN背障的t栅e模alin /GaN HEMT的漏极电流和射频特性。结果表明,氮化硼镓背势垒可以有效地抑制通道区域的二维电子气体(2DEG),有效地抑制短通道效应。与普通GaN缓冲HEMT相比,仅含2% b分量的BGaN背垒HEMT大大提高了器件的模拟和射频性能,例如跨导(0.15 S)、固有增益、早期电压(4.24 V)、截止频率(141 GHz)、GFP (356 GHz)、GTFP (4.6 THz)和跨导频率积(6.5 THz)。因此,具有BGaN背垒的器件在需要在高频和高增益功率下工作的极线性器件的应用中具有相当大的潜力。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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