Evaluation of loss and APHC of DC-biased low K transmission line in MMICs technologies

Hung-Wei Wu, M. Weng, Y. Su, C. Hung, Ru‐Yuan Yang
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Abstract

In this paper, effective dielectric constant, line attenuation and characteristic impedance, average power handling capability (APHC) of DC-biased thin film microstrip line (TFML) as interconnection for monolithic microwave integrated circuits (MMICs) is investigated. The TFML is fabricated on standard low resistivity silicon (LRS) substrate (rho les 10 Omega-cm ) by incorporating a spin-on dielectric polyimide and sputtering of aluminum. An accurate on-wafer-procedure for extracting the microwave characteristics of TFML up to 50 GHz is described and the method is successfully applied to low-K polyimide deposited on the silicon.
mmic技术中直流偏置低K传输线的损耗和APHC评估
研究了用于单片微波集成电路互连的直流偏置薄膜微带线的有效介电常数、线路衰减和特性阻抗、平均功率处理能力。TFML是在标准低电阻硅(LRS)衬底(rho小于10 ω -cm)上通过结合自旋介电聚酰亚胺和铝溅射制成的。本文描述了一种精确的硅片上提取高达50 GHz的TFML微波特性的方法,并成功地应用于沉积在硅片上的低k聚酰亚胺。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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