Perpendicular Media Overcoat Coverage Challenge

Q. Dai, K. Takano, G. Wang, E. Brinkman, R. Waltman, V. Nayak, B. Yen
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引用次数: 2

Abstract

The perpendicular media investigated employed silicon oxide in the recording layer to facilitate grain segregation, as reported. Overcoat used for these studies includes sputtered CNx, SiNx and ion beam carbon. Method for corrosion assessment includes (1) ICP-MS measurement of extractable Co, (2) Electrochemical polarization curve, and (3) Temperature and Relative Humidity (T&RH) condensation test. Roughness-induced challenges on subsequent post processing steps is reported. Because PMR media is reported to have high surface roughness, our first study has been designed to quantify overcoat coverage limit and compare that with longitudinal media.
垂直媒体大衣覆盖挑战
据报道,所研究的垂直介质在记录层中使用氧化硅来促进晶粒偏析。用于这些研究的涂层包括溅射CNx、SiNx和离子束碳。腐蚀评价方法包括(1)ICP-MS测定可萃取Co,(2)电化学极化曲线,(3)温度和相对湿度(T&RH)冷凝试验。随后的后处理步骤的粗糙度引起的挑战被报道。由于据报道PMR介质具有高表面粗糙度,我们的第一项研究旨在量化大衣覆盖极限,并将其与纵向介质进行比较。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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