A 16Kb Antifuse One-Time-Programmable Memory in 5nm High-K Metal-Gate Fin-FET CMOS Featuring Bootstrap High Voltage Scheme, Read Endpoint Detection and Pseudo-Differential Sensing

S. Chou, Gu-Huan Li, Shawn Chen, Jun-Hao Chang, Wan-Hsueh Cheng, Shao-Ding Wu, P. Fan, Chia-En Huang, Y. Chih, Yih Wang, Jonathan Chang
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Abstract

A 16Kb one-time-programmable (OTP) antifuse memory is fabricated in a 5nm high-K, metal-gate FinFET CMOS for the first time. The bootstrap high voltage scheme (BHVS), read endpoint detection (REPD) and pseudo-differential sensing (PDS) are implemented to achieve intrinsic bit error rate (BER) below 1ppb for in-field programming in 5nm SoC and 10 years of data retention at 125°C.
一种5nm高k金属栅极fet CMOS 16Kb反熔丝一次性可编程存储器,具有自启动高压方案、读端点检测和伪差分传感
首次在5nm高k金属栅极FinFET CMOS中制备了16Kb一次性可编程(OTP)防熔丝存储器。采用自引导高压方案(BHVS)、读取端点检测(REPD)和伪差分传感(PDS),实现了5nm SoC现场编程的内在误码率(BER)低于1ppb,并在125°C下保持了10年的数据。
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