Design of the advanced divertor pump cryogenic system for DIII-D

K. Schaubel, C. Baxi, G. Campbell, A. M. Gootgeld, A. Langhorn, G. J. Laughon, J. P. Smith, P. M. Anderson, M. M. Menon
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引用次数: 4

Abstract

The design of the cryogenic system for the DIII-D advanced divertor cryocondensation pump is presented. The advanced divertor incorporates a baffle chamber and bias ring located near the bottom of the DIII-D vacuum vessel. A 50000-l/s cryocondensation pump will be installed underneath the baffle for plasma particle exhaust. The pump consists of a liquid-helium-cooled tube operating at 4.3 K and a liquid-nitrogen-cooled radiation shield. Liquid helium is fed by forced flow through the cryopump. Compressed helium gas flowing through the high-pressure side of a heat exchanger is regeneratively cooled by the two-phase helium leaving the pump. The cooled high-pressure gaseous helium is then liquefied by a Joule-Thomson expansion valve. The liquid is returned to a storage dewar. The liquid nitrogen for the radiation shield is supplied by forced flow from a bulk storage system. Control of the cryogenic system is accomplished by a programmable logic controller.<>
DIII-D先进导流泵低温系统设计
介绍了DIII-D型高级导流器低温冷凝泵低温系统的设计。先进的导流器包括位于DIII-D真空容器底部附近的挡板室和偏置环。在挡板下方安装50000 l/s的低温冷凝泵,用于等离子体粒子排气。该泵由一个运行在4.3 K的液氦冷却管和一个液氮冷却辐射屏蔽体组成。液氦通过强制流动通过低温泵输送。流经热交换器高压侧的压缩氦气被离开泵的两相氦气重新冷却。冷却后的高压气态氦随后由焦耳-汤姆逊膨胀阀液化。液体返回到储存杜瓦瓶中。用于辐射屏蔽的液氮由来自散装存储系统的强制流动提供。低温系统的控制由可编程逻辑控制器完成。
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