Leakage Reduction by Modified Stacking and Optimum ISO Input Loading in CMOS Devices

K. Sathyaki, R. Paily
{"title":"Leakage Reduction by Modified Stacking and Optimum ISO Input Loading in CMOS Devices","authors":"K. Sathyaki, R. Paily","doi":"10.1109/ADCOM.2007.83","DOIUrl":null,"url":null,"abstract":"In this paper, we have considered different circuit techniques to reduce leakage currents in digital CMOS circuits. In this study, an emphasis is given on gate leakage and sub threshold components of leakage currents. The leakage currents of 65 nm and 45 nm technology node NMOS/PMOS transistor and simple CMOS inverter are compared with low leakage current circuits. The modified stack forcing scheme with optimum iso input load condition gave leakage reduction by a factor of 7 compared to the normal stack forcing technique.","PeriodicalId":185608,"journal":{"name":"15th International Conference on Advanced Computing and Communications (ADCOM 2007)","volume":"7 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2007-12-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"15","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"15th International Conference on Advanced Computing and Communications (ADCOM 2007)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ADCOM.2007.83","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 15

Abstract

In this paper, we have considered different circuit techniques to reduce leakage currents in digital CMOS circuits. In this study, an emphasis is given on gate leakage and sub threshold components of leakage currents. The leakage currents of 65 nm and 45 nm technology node NMOS/PMOS transistor and simple CMOS inverter are compared with low leakage current circuits. The modified stack forcing scheme with optimum iso input load condition gave leakage reduction by a factor of 7 compared to the normal stack forcing technique.
CMOS器件中改进的堆叠和最佳ISO输入负载减少泄漏
在本文中,我们考虑了不同的电路技术,以减少漏电流的数字CMOS电路。在这项研究中,重点是漏电流的门漏和亚阈值分量。对65 nm和45 nm工艺节点的NMOS/PMOS晶体管和简单CMOS逆变器的漏电流与低漏电流电路进行了比较。采用最佳等输入载荷条件的改进堆压方案,与常规堆压技术相比,泄漏量减少了7倍。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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