S. Lischke, A. Peczek, F. Korndörfer, C. Mai, H. Haisch, M. Koenigsmann, M. Rudisile, D. Steckler, F. Goetz, M. Fraschke, S. Marschmeyer, A. Krüger, Y. Yamamoto, D. Schmidt, U. Saarow, P. Heinrich, A. Kroh, M. Schubert, J. Katzer, P. Kulse, A. Trusch, L. Zimmermann
{"title":"Ge Photodiode with -3 dB OE Bandwidth of 110 GHz for PIC and ePIC Platforms","authors":"S. Lischke, A. Peczek, F. Korndörfer, C. Mai, H. Haisch, M. Koenigsmann, M. Rudisile, D. Steckler, F. Goetz, M. Fraschke, S. Marschmeyer, A. Krüger, Y. Yamamoto, D. Schmidt, U. Saarow, P. Heinrich, A. Kroh, M. Schubert, J. Katzer, P. Kulse, A. Trusch, L. Zimmermann","doi":"10.1109/IEDM13553.2020.9372033","DOIUrl":null,"url":null,"abstract":"We present an SOI-waveguide coupled germanium photodiode with very high OE -3 dB bandwidth of ≥110 GHz at reverse bias of 2 V. This performance is achieved by a novel construction in that the germanium is sandwiched in between two in-situ doped silicon regions. This fabrication approach allows for avoiding ion-implantation into the germanium, which is certainly beneficial for the bandwidth as minority carrier diffusion effects are strongly suppressed. A responsivity of >0.6 A/W at 1550 nm (-2 V) is achieved, while the dark current of this device yields to about 300 nA (-2 V). To our knowledge, this is the most advanced germanium photo detector in terms of bandwidth combined with state-of-the-art responsivity as well as moderate dark currents. We demonstrate that the novel photodiodes can be fabricated with high yield.","PeriodicalId":415186,"journal":{"name":"2020 IEEE International Electron Devices Meeting (IEDM)","volume":"38 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2020-12-12","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"8","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2020 IEEE International Electron Devices Meeting (IEDM)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IEDM13553.2020.9372033","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 8
Abstract
We present an SOI-waveguide coupled germanium photodiode with very high OE -3 dB bandwidth of ≥110 GHz at reverse bias of 2 V. This performance is achieved by a novel construction in that the germanium is sandwiched in between two in-situ doped silicon regions. This fabrication approach allows for avoiding ion-implantation into the germanium, which is certainly beneficial for the bandwidth as minority carrier diffusion effects are strongly suppressed. A responsivity of >0.6 A/W at 1550 nm (-2 V) is achieved, while the dark current of this device yields to about 300 nA (-2 V). To our knowledge, this is the most advanced germanium photo detector in terms of bandwidth combined with state-of-the-art responsivity as well as moderate dark currents. We demonstrate that the novel photodiodes can be fabricated with high yield.