Sub-wavelength resolution laser lithography in the field of MEMS

G. Moagăr-Poladian
{"title":"Sub-wavelength resolution laser lithography in the field of MEMS","authors":"G. Moagăr-Poladian","doi":"10.1117/12.801971","DOIUrl":null,"url":null,"abstract":"In this paper I present some techniques by which MEMS structures with sub-wavelength resolution can be obtained when using laser lithography. I concentrate on two major techniques: single photon and multi-photon absorption processes.","PeriodicalId":390439,"journal":{"name":"Industrial Laser Applications: INDLAS","volume":"136 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2008-03-03","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Industrial Laser Applications: INDLAS","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1117/12.801971","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1

Abstract

In this paper I present some techniques by which MEMS structures with sub-wavelength resolution can be obtained when using laser lithography. I concentrate on two major techniques: single photon and multi-photon absorption processes.
亚波长分辨率激光光刻在MEMS领域的应用
本文介绍了利用激光光刻技术获得亚波长分辨率的MEMS结构的一些技术。我集中在两个主要的技术:单光子和多光子吸收过程。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 求助全文
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信