Sub-wavelength resolution laser lithography in the field of MEMS

G. Moagăr-Poladian
{"title":"Sub-wavelength resolution laser lithography in the field of MEMS","authors":"G. Moagăr-Poladian","doi":"10.1117/12.801971","DOIUrl":null,"url":null,"abstract":"In this paper I present some techniques by which MEMS structures with sub-wavelength resolution can be obtained when using laser lithography. I concentrate on two major techniques: single photon and multi-photon absorption processes.","PeriodicalId":390439,"journal":{"name":"Industrial Laser Applications: INDLAS","volume":null,"pages":null},"PeriodicalIF":0.0000,"publicationDate":"2008-03-03","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Industrial Laser Applications: INDLAS","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1117/12.801971","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1

Abstract

In this paper I present some techniques by which MEMS structures with sub-wavelength resolution can be obtained when using laser lithography. I concentrate on two major techniques: single photon and multi-photon absorption processes.
亚波长分辨率激光光刻在MEMS领域的应用
本文介绍了利用激光光刻技术获得亚波长分辨率的MEMS结构的一些技术。我集中在两个主要的技术:单光子和多光子吸收过程。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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