A 0.1 /spl mu/m W-band HEMT production process for high yield and high performance low noise and power MMICs

Abstract

We have developed a W-band HEMT MMIC process which has demonstrated reproducible high performance for both low noise and power amplifier designs. This paper presents the details of the fabrication process as well as device and circuit results from 69 wafers. Three-stage LNAs have demonstrated noise figure as low as 4.4 dB with gains as high as 27 dB from 92 to 96 GHz. The LNA RF lot yield was as high as 78%. The same process has demonstrated power amplifiers with output power of 19 dBm at 94 GHz, with RF yield of 37%.