4H-SiC MESFET's on high resistivity substrates with 30 GHz f/sub max/

S. Allen, J. Palmour, V. Tsvetkov, S. Macko, C. Carter, C. Weitzel, K. Moore, K. Nordquist, L. Pond
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引用次数: 4

Abstract

MESFET's fabricated on high resistivity 4H-SiC substrates have attained an f/sub max/ of 30.5 GHz and an f/sub /spl tau// of 14.0 GHz. Both of these figures of merit are the highest ever reported for a SiC MESFET, and this is the first report of high resistivity 4H-SiC substrates. With the continued advances in bulk crystal growth, including the availability of high resistivity material, the development of two-inch substrates and the reduction of micropipe defect densities to <30 cm/sup -2/, SiC is rapidly emerging as a viable technology for high power microwave applications.
高电阻率基片上的4H-SiC MESFET, fmax /sub / 30ghz
在高电阻率4H-SiC衬底上制备的MESFET的f/sub max/达到了30.5 GHz, f/sub /spl tau//达到了14.0 GHz。这两个优点都是有史以来报道的SiC MESFET中最高的,这是高电阻率4H-SiC衬底的首次报道。随着块状晶体生长的不断进步,包括高电阻率材料的可用性,两英寸衬底的发展以及微管缺陷密度降低到<30 cm/sup -2/, SiC正在迅速成为高功率微波应用的可行技术。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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