Reactive magnetron sputtering: an offline parameter identification method

Abstract

The goal of this paper is the offline parameter identification of the Berg model, intended to be used for magnetron sputtering and thin film deposition process control. A graphical parameter estimation method is developed using simplified equations that contain only the most significant terms in both metallic and poisoned modes of operation. The approximations are based on numerical examples. Special experiment conditions are also formulated that better facilitate the identification of some model parameters.