SEU Prediction for Very Integrated Circuits based on Advanced Physical Considerations

N. Rostand, G. Hubert, S. Martinie
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引用次数: 2

Abstract

SET compact modeling for SEU prediction is faced to new challenges for advanced technological nodes. Some works have already addressed these challenges, proposing modeling approach for new relevant physical aspects like bipolar amplification, 3D charge deposit morphology, and bipolar amplification. Very recently, we have developed a fully compact SET model for very integrated technologies taking these effects into account, suitable for SPICE simulations. In this paper, we propose to couple this SET compact model with MUSCA SEP3 soft errors simulation plateform, in order to address soft error risk assessment for very integrated technologies. SBU/MCU predictions are performed in FDSOI based SRAM memories after TCAD calibration of our SET compact model. The purpose is to show how bipolar amplification, 3D charge deposit morphology, and SET/circuit coupling are able to influence simulated SBU/MCU cross sections values.
基于高级物理考虑的非常集成电路的SEU预测
面向先进技术节点的SEU预测的SET紧凑建模面临着新的挑战。一些研究已经解决了这些挑战,提出了新的相关物理方面的建模方法,如双极放大、3D电荷沉积形态和双极放大。最近,我们开发了一个完全紧凑的SET模型,用于非常集成的技术,考虑到这些影响,适用于SPICE模拟。在本文中,我们提出将该SET紧凑模型与MUSCA SEP3软误差仿真平台耦合,以解决非常集成的技术的软误差风险评估问题。在对我们的SET紧凑型模型进行TCAD校准后,在基于FDSOI的SRAM存储器中进行SBU/MCU预测。目的是展示双极放大、3D电荷沉积形态和SET/电路耦合如何影响模拟的SBU/MCU横截面值。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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