Scalable Logic Gate Non-Volatile Memory

Lee Wang, S. Hsu
{"title":"Scalable Logic Gate Non-Volatile Memory","authors":"Lee Wang, S. Hsu","doi":"10.1109/NVMTS.2014.7060846","DOIUrl":null,"url":null,"abstract":"Scalable Logic Gate Non-Volatile Memory (SLGNVM) devices fabricated with standard CMOS logic process have been demonstrated with 110 nm, 55 nm, and 40 nm nodes. The cell sizes for the NOR flash array complied with the process design rules of the CMOS logic nodes are 0.5424 μm2, 0.2287 μm2, and 0.1095 μm2, respectively. The SLGNVM devices have 3V ~ 5V program/erase windows with good data retention and endurance properties. The arrays of SLGNVM devices are suitable for embedded EEPROM and flash in digital circuitries, and for the new applications of non-volatile-SRAM (nvSRAM), Non-Volatile-Register (NVR), and non-volatile FPGA (nvFPGA).","PeriodicalId":275170,"journal":{"name":"2014 14th Annual Non-Volatile Memory Technology Symposium (NVMTS)","volume":"32 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2014-10-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2014 14th Annual Non-Volatile Memory Technology Symposium (NVMTS)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/NVMTS.2014.7060846","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0

Abstract

Scalable Logic Gate Non-Volatile Memory (SLGNVM) devices fabricated with standard CMOS logic process have been demonstrated with 110 nm, 55 nm, and 40 nm nodes. The cell sizes for the NOR flash array complied with the process design rules of the CMOS logic nodes are 0.5424 μm2, 0.2287 μm2, and 0.1095 μm2, respectively. The SLGNVM devices have 3V ~ 5V program/erase windows with good data retention and endurance properties. The arrays of SLGNVM devices are suitable for embedded EEPROM and flash in digital circuitries, and for the new applications of non-volatile-SRAM (nvSRAM), Non-Volatile-Register (NVR), and non-volatile FPGA (nvFPGA).
可扩展逻辑门非易失性存储器
采用标准CMOS逻辑工艺制备的可扩展逻辑门非易失性存储器(SLGNVM)器件已被证明具有110 nm, 55 nm和40 nm节点。符合CMOS逻辑节点工艺设计规则的NOR闪存阵列的单元尺寸分别为0.5424 μm2、0.2287 μm2和0.1095 μm2。SLGNVM器件具有3V ~ 5V的程序/擦除窗口,具有良好的数据保留和持久性能。SLGNVM器件阵列适用于数字电路中的嵌入式EEPROM和闪存,以及非易失性sram (nvSRAM)、非易失性寄存器(NVR)和非易失性FPGA (nvFPGA)等新应用。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 求助全文
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信