The physics of "vacuum" breakdown

F. Schwirzke, M. P. Hallal, X. K. Maruyama
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Abstract

The initial plasma formation on the surface of a cathode of a vacuum diode, vacuum arc, and many other discharges is highly non-uniform. Micron-sized cathode spots form within nanoseconds. Despite the fundamental importance of cathode spots for the breakdown process, their structure, and the source of the required high energy density were not well understood. When an increasing voltage is applied, enhanced field emission of electrons begins from a growing number of small spots or whiskers. This and the impact of ions stimulate desorption of weakly bound adsorbates from the surface of a whisker. The cross section for ionization of the neutrals has a maximum for ~ 100 eV electrons. As the diode voltage increases, the 100 V equipotential surface which moves towards the cathode is met by the desorbed neutrals moving away from the cathode. These two regions proceed from no overlap to a significant amount of overlap on a nanosecond time scale. This results in the sharp risetime for the onset of ionization. Ions produced in the ionization region, a few μm from the electron emitting spot are accelerated back. This bombardment with ~ 100 eV ions leads to surface heating of the spot. Since the ion energy is deposited only within a few atomic layers at a time instead of an entire whisker volume, and since the neutral contaminants are only loosely bound to the surface, the onset of breakdown by this mechanism requires much less current than the joule heating mechanism. Ion surface heating is initially orders of magnitude larger than joule heating. As more ions are produced, a positive space charge layer forms which enhances the electric field and thus strongly enhances the field emitted electron current. The localized build-up of plasma above the electron emitting spot then naturally leads to pressure and electric field distributions which ignite unipolar arcs. The high current density of the unipolar arc and the associated surface heating by ions provide the "explosive" formation of a cathode spot plasma.
“真空”击穿的物理学原理
在真空二极管、真空电弧和许多其他放电的阴极表面上的初始等离子体形成是高度不均匀的。微米大小的阴极斑点在纳秒内形成。尽管阴极点在击穿过程中具有基本的重要性,但它们的结构和所需高能量密度的来源尚未得到很好的理解。当施加的电压增加时,增强的电子场发射开始于越来越多的小点或晶须。这和离子的冲击刺激了从晶须表面的弱结合吸附物的解吸。中性离子的电离截面在~ 100 eV的电子处有最大值。当二极管电压增加时,向阴极移动的100 V等电位表面与从阴极移动的解吸中性相遇。在纳秒的时间尺度上,这两个区域从没有重叠到有大量重叠。这导致电离开始的时间急剧上升。在离电子发射点几μm的电离区产生的离子被加速返回。~ 100 eV离子的轰击导致点的表面加热。由于离子能量一次只沉积在几个原子层内,而不是整个晶须体积内,并且由于中性污染物只是松散地结合在表面,因此这种机制开始击穿所需的电流比焦耳加热机制少得多。离子表面加热最初比焦耳加热大几个数量级。当更多的离子产生时,形成一个正空间电荷层,它增强了电场,从而强烈地增强了场发射的电子电流。等离子体在电子发射点上方的局部积聚自然导致压力和电场分布,从而点燃单极电弧。单极电弧的高电流密度和离子的相关表面加热提供了阴极斑点等离子体的“爆炸性”形成。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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