MOVPE growth of 1220 nm (In,Ga)(As,P)/InP LED structures

R. Kúdela, M. Kučera, D. Gregušová, V. Cambel, J. Novák
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引用次数: 0

Abstract

In/sub 1-x/Ga/sub x/As/sub 1-y/P/sub y//InP layers and LED structures were prepared for the wavelength 1220 nm by LP MOVPE. Very high phosphine/arsine ratio (>100) was necessary to achieve desirable quaternary composition at the growth temperature of 650/spl deg/C. Very good surface morphology with the height of the growth steps of one monolayer was measured by AFM on the lattice matched layers. Significant shift of the photoluminescence spectra from p-type layers, contrary to n-type or undoped layers, was measured at 5 K. The electroluminescent spectrum from a quaternary LED measured at 300 K with a maximum at 1224.6 nm is shown.
1220 nm (In,Ga)(As,P)/InP LED结构的MOVPE生长
利用LP MOVPE制备了波长为1220nm的In/sub 1-x/Ga/sub x/As/sub 1-y/P/sub y/ InP层和LED结构。在650/spl℃的生长温度下,需要很高的磷化氢/胂比(>100)才能达到理想的季元组成。用原子力显微镜在晶格匹配层上观察到良好的表面形貌和单层生长台阶的高度。在5k时,p型层的光致发光光谱与n型层或未掺杂层的光致发光光谱发生了明显的变化。显示了在300 K下测量的四元LED的电致发光光谱,其最大值为1224.6 nm。
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