Downstream characterization of an oxygen atmospheric pressure plasma jet

Y. Yang, H. Li, C. Hsu
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Abstract

The characterization of the downstream of an oxygen atmospheric pressure plasma jet (APPJ) is performed. This APPJ is sustained by pulsed power with a repetitive frequency up to 25 kHz. The reactivity of the plasma at different operating conditions is characterized using the intensities of O2 (759 nm) and O (777 nm) optical emission lines. The jet downstream temperature is measured by a thermocouple. It is shown that the intensity of O2 emission is not sensitive to the flow rate while it increases with the increase in the applied voltage. O emission is only observed at high flow rate. The temperature measurement shows that it slightly increases with the applied voltage. At the jet exit, the temperature monotonically increases with the flow rate while at 1 cm downstream of the jet, it shows an opposite trend. It is shown that the existence of an external surface at the downstream greatly influences the emission spectra adjacent to the surface. When the jet downstream is shielded with a glass tube, the O radical emission intensity increases by more than one order of magnitude. Preliminary studies show that the presence of the surface potentially enhances certain surface reactions. Such an enhancement leads to the increase of the O radical density, as suggested by the spatial-resolved optical emission spectra.
氧大气压等离子体射流的下游特性
对氧常压等离子体射流(APPJ)的下游进行了表征。该APPJ是由脉冲功率与重复频率高达25千赫维持。利用O2 (759 nm)和O (777 nm)光发射线的强度表征了等离子体在不同操作条件下的反应性。射流下游温度由热电偶测量。结果表明,O2的发射强度对流量不敏感,而随施加电压的增加而增大。只有在高流速下才观察到O的排放。温度测量结果表明,温度随外加电压的升高而略有升高。在射流出口,温度随流量单调升高,而在射流下游1cm处,温度则呈现相反的趋势。结果表明,在下游存在一个外表面对其附近的发射光谱有很大的影响。当下游射流被玻璃管屏蔽时,O自由基发射强度增加了一个数量级以上。初步研究表明,表面的存在可能会增强某些表面反应。空间分辨发射光谱表明,这种增强导致O自由基密度增加。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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