MSM diodes based on an AlGaN/GaN HEMT layer structure for varactor and photodiode application

M. Marso, J. Bernát, A. Wolter, P. Javorka, A. Fox, P. Kordos
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引用次数: 12

Abstract

The electrical and optoelectronic properties of MSM diodes that are based on an AlGaN/GaN HEMT layer system are investigated. Device fabrication uses standard HEMT processing steps, allowing integration in HEMT circuits without the need of sophisticated growth or etching techniques. The C/sub MAX//C/sub MIN/ ratio can be tuned by electrode geometry in contrast to conventional varactor diode concepts. Capacitance ratios up to 100 have been reached that exceed best values for published heterostructure varactor diodes. RF optimized devices with 0.5 /spl mu/m electrode length exhibit cut-off frequencies up to 86 GHz. Optoelectronic measurements show the potential of the device as MSM photodetector.
基于AlGaN/GaN HEMT层结构的MSM二极管用于变容二极管和光电二极管
研究了基于AlGaN/GaN HEMT层体系的MSM二极管的电学和光电性能。器件制造使用标准的HEMT加工步骤,允许集成在HEMT电路中,而不需要复杂的生长或蚀刻技术。与传统的变容二极管概念相比,C/sub MAX//C/sub MIN/比值可以通过电极几何形状来调节。电容比已达到100,超过了已发表的异质结构变容二极管的最佳值。电极长度为0.5 /spl mu/m的射频优化器件的截止频率高达86 GHz。光电测量显示了该器件作为MSM光电探测器的潜力。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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