Modeling and Simulation of 7T SRAM Cell at Various Process Corners at 45 nm Process Technology

K. Mishra, S. Akashe
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引用次数: 2

Abstract

Designing static random access memory cell (SRAM), low power and leakage current using nano-scale technology ranges, Low power supply voltage is an effective technique for low power reduction in memory design, however traditional memory cell design fails to operate at ultra low voltage regime, then a new cell structure need to operate cell in low voltage regime. Therefore a single ended input output 7 transistor SRAM cell for using 45nm cmos technology and it is suitable for low voltage regime. Schmitt trigger based SRAM is proposed which provide better read stability, write ability and process variation tolerance compared to standard 6 transistor SRAM cell. This technology reduces power as well leakage current and improves signal noise margin (SNM).
45纳米工艺下7T SRAM电池不同工艺角的建模与仿真
采用纳米级技术设计静态随机存取存储单元(SRAM),在低功耗和漏电流范围内,低电源电压是存储器设计中降低功耗的有效技术,但传统的存储单元设计无法在超低电压下工作,因此需要一种新的存储单元结构来实现低电压下的存储单元工作。因此,单端输入输出7晶体管SRAM单元使用45nm cmos技术,它适用于低电压状态。与标准的6晶体管SRAM单元相比,基于Schmitt触发器的SRAM具有更好的读取稳定性、写入能力和过程变化容忍度。该技术降低了功率和泄漏电流,提高了信号噪声裕度(SNM)。
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