Compact Drain Current Model of Silicon-Nanotubebased Double Gate-All-Around (DGAA) MOSFETs Incorporating Short Channel Effects

Arun Kumar, P. Srinivas, Pramod Kumar Tiwari
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引用次数: 4

Abstract

This paper reports a compact drain current model of silicon nanotube-based double gate all around (DGAA) MOSFET incorporating short channel effects (SCEs). The drain current equation is expressed as a function of charge density, which is derived using the unified surface potential expressions. Fermi-Dirac statistics, the 1-dimensional density of states and Gauss's law have been utilized to develop the analytical expressions of unified surface potentials and charge density. The proposed compact model also takes into account of quantum confinement effects which is significant in devices with the ultra-thin channel region. The SCEs such as velocity saturation effect, threshold voltage roll-off, DIBL, channel length modulation, velocity overshoot, and mobility degradation are well incorporated in the developed model in order to correctly predict the device output and transfer characteristics. Results obtained from the proposed compact drain current model have been validated with TCAD results obtained from the Sentauras device simulator.
考虑短沟道效应的硅纳米管双栅-全能(DGAA) mosfet的紧凑漏极电流模型
本文报道了一种具有短沟道效应的硅纳米管型全环双栅(DGAA) MOSFET的紧凑漏极电流模型。漏极电流方程表示为电荷密度的函数,电荷密度是用统一的表面电位表达式导出的。利用费米-狄拉克统计、一维态密度和高斯定律建立了统一表面势和电荷密度的解析表达式。所提出的紧凑模型还考虑了量子约束效应,这在具有超薄通道区域的器件中是重要的。速度饱和效应、阈值电压滚降、DIBL、信道长度调制、速度超调和迁移率退化等ses被很好地纳入到所开发的模型中,以便正确预测器件输出和传输特性。从提出的紧凑漏极电流模型得到的结果与从Sentauras器件模拟器得到的TCAD结果进行了验证。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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