{"title":"Design of heated-micro-resonator rings","authors":"S. Lei, R. Enright, A. Shen","doi":"10.1109/THERMINIC.2016.7749058","DOIUrl":null,"url":null,"abstract":"To facilitate the design the heated-micro-resonator rings, we develop a numerical model. Particularly, an etching model based on a diffusion equation is implemented to distinguish the etched and non-etched regions. The simulations reveal that air trenches can significantly increase the thermal resistance and, as a result, reduce the power consumed in the heater to get the same tuning performance. It is found that the tunability of MRR is exponentially enhanced with the underetch level as RL > 0.825, whereas the tuning efficiency is almost the same, as RL <; 0.825. The tuning efficiency is ~0.1 nm/mW without air trenches, but it becomes 20× larger at the etched-through extreme.","PeriodicalId":143150,"journal":{"name":"2016 22nd International Workshop on Thermal Investigations of ICs and Systems (THERMINIC)","volume":"83 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2016-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2016 22nd International Workshop on Thermal Investigations of ICs and Systems (THERMINIC)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/THERMINIC.2016.7749058","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
To facilitate the design the heated-micro-resonator rings, we develop a numerical model. Particularly, an etching model based on a diffusion equation is implemented to distinguish the etched and non-etched regions. The simulations reveal that air trenches can significantly increase the thermal resistance and, as a result, reduce the power consumed in the heater to get the same tuning performance. It is found that the tunability of MRR is exponentially enhanced with the underetch level as RL > 0.825, whereas the tuning efficiency is almost the same, as RL <; 0.825. The tuning efficiency is ~0.1 nm/mW without air trenches, but it becomes 20× larger at the etched-through extreme.