{"title":"A short channel MOSFET model","authors":"E. Valsamakis","doi":"10.1109/IEDM.1977.189306","DOIUrl":null,"url":null,"abstract":"The MOSFET equivalent circuit model described incorporates short channel and temperature effects. It includes expressions for the device current in the subthreshold, triode and saturation regions and uses a field dependent mobility and a drain voltage dependent threshold voltage. The drain current-voltage characteristic and its first derivative are continuous in all regions. Relationships for the gate-source and gate-drain capacitances are derived as a function of the device potentials using a field dependent mobility. Using the closed form expressions of this model, simulations were performed for micron long devices having uniform and ion-implanted channel profiles and compared with data at room, above room and liquid nitrogen temperature.","PeriodicalId":218912,"journal":{"name":"1977 International Electron Devices Meeting","volume":"28 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"5","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"1977 International Electron Devices Meeting","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IEDM.1977.189306","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 5
Abstract
The MOSFET equivalent circuit model described incorporates short channel and temperature effects. It includes expressions for the device current in the subthreshold, triode and saturation regions and uses a field dependent mobility and a drain voltage dependent threshold voltage. The drain current-voltage characteristic and its first derivative are continuous in all regions. Relationships for the gate-source and gate-drain capacitances are derived as a function of the device potentials using a field dependent mobility. Using the closed form expressions of this model, simulations were performed for micron long devices having uniform and ion-implanted channel profiles and compared with data at room, above room and liquid nitrogen temperature.