A study on the use of parallel wiring techniques for sub-20nm designs

Abstract

Wire sizing can be used to reduce the delays of critical nets. However, because of the forbidden pitch issue in sub-20nm designs, wide wires may no longer be an attractive solution because of the restrictive wire spacing requirement from advanced lithography. In this work, we investigate the suitability of the parallel wiring technique, in which multiple parallel wires are used to route the same net, as an alternative to routing a net using a single wide wire. In particular, we study the trade offs between parasitics, timing, power, and routing resources. Our study reveals that wire sizing using both parallel wires and wide wires can be advantageous. Moreover, if high layout densities are required, parallel wiring can be a viable approach in solving timing problems for sub-20nm designs.