Research on removal function and ion beam figuring process for ultra-precision manufacturing optical components

Xiaojing Li, Dasen Wang, F. Nie, Pengfei Wu, Shiyan Zhao
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Abstract

Surface of fused silica optical components were polished by Ion Beam Figuring (IBF) ultra-precision process. Based on the analysis of the relationship between the ion beam current density distribution parameters obtained by faraday scan and the removal function, the removal function model for IBF was established. The IBF experiment for fused silica optical materials were carried out. The experimental results show that the IBF method based on faraday scan can achieve the same figure correcting ability as the traditional IBF method based on line scan experiment. But the offline calculation time of the removal function can be reduced from 2 hours to 5minutes, which improves the efficiency of IBF greatly. After several cycles the initial surface figure error of the optical element before processing, with a PV value from more than 500 nm to less than 15nm and an RMS value from more than 120nm to less than 1.5 nm. Ultra-precision surface of fused silica optical components with nanometer scale were obtained by IBF.
超精密制造光学元件的去除函数及离子束计算工艺研究
采用离子束成形(IBF)超精密工艺对熔融石英光学元件进行表面抛光。在分析法拉第扫描获得的离子束电流密度分布参数与去除函数关系的基础上,建立了IBF的去除函数模型。对熔融石英光学材料进行了IBF实验。实验结果表明,基于法拉第扫描的IBF方法可以达到与基于线扫描实验的传统IBF方法相同的图形校正能力。而去除函数的离线计算时间可以从2小时缩短到5分钟,大大提高了IBF的效率。经过几个周期后,光学元件加工前的初始表面图形误差,PV值从大于500nm到小于15nm, RMS值从大于120nm到小于1.5 nm。利用IBF技术获得了纳米级熔融石英光学元件的超精密表面。
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