Low-field mobility and piezoresistivity of holes in germanium and silicon

V. P. Dragunov, D. Boldyrev
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Abstract

A theoretical calculation of the low-field mobility and piezoresistance coefficients of holes in germanium and silicon is carried out incorporating all relevant details of the band structure. The scattering have been limited to acoustic and optical phonons and ionized-impurity and is described by the deformation potentials a, b, d and d/sub 0/. Values of the piezoresistance coefficients are calculated using matrix 6/spl times/6 expressions for the strain dependent energy-wave vector relations of the valence bands and the known deformation potentials. The calculated values of the first-order piezoresistance coefficients are found to agree fairly well with the experimental data.
锗和硅中空穴的低场迁移率和压阻性
对锗和硅中空穴的低场迁移率和压阻系数进行了理论计算,并结合了能带结构的所有相关细节。散射仅限于声子和光学声子以及电离杂质,并由变形势a、b、d和d/sub 0/描述。用矩阵6/spl × /6的应变依赖价带能量波矢量关系表达式和已知变形势计算压阻系数。一阶压阻系数的计算值与实验数据吻合较好。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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