Experimental Investigation on Failure Mechanism of SiC Power MOSFETs under Single Pulse Avalanche Stress

Zijian Gao, Qing Guo, Na Ren, Kuang Sheng
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引用次数: 2

Abstract

In this paper, the typical V-T (avalanche voltage v.s. temperature) model is used to estimate the maximum junction temperature (Tj) during the single pulse unclamped inductive switching (UIS) tests. Experimental results show that the maximum Tj at failure will reach 670$\sim$890K, which is less than the melting point of aluminum (933K). The typical parasitic BJT turn-on model with practical chip layout is used to analyze the possible failure mechanism. Different Tj calculation models are compared to show the accuracy of the V-T model. The UIS tests at different ambient temperatures are conducted to show the device failure is independent on the fixed critical temperature. Distribution of failure spots of decapsulated failed DUTs is observed under the optical microscope.
单脉冲雪崩应力作用下SiC功率mosfet失效机理的实验研究
本文采用典型的V-T(雪崩电压对温度)模型来估计单脉冲无箝位电感开关(UIS)测试时的最大结温(Tj)。实验结果表明,失效时的最大Tj为670美元/ 890K,小于铝的熔点(933K)。采用具有实际芯片布局的典型寄生BJT导通模型,分析了可能的失效机理。比较了不同的Tj计算模型,验证了V-T模型的准确性。在不同的环境温度下进行了UIS测试,以表明设备故障与固定的临界温度无关。在光学显微镜下观察脱囊失效DUTs的失效点分布。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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