{"title":"Oxidation of GaAlAs red LED surface due to light irradiation","authors":"T. Shimozaki, T. Okino, M. Yamane","doi":"10.1109/SIM.1998.785110","DOIUrl":null,"url":null,"abstract":"Formation of a light absorptive layer on the surface of a GaAlAs LED due to light irradiation has been studied by irradiating red, green light and infrared ray LEDs on a pellet of a GaAlAs device. The Auger electron spectroscopy depth profiles and electron probe micro analysis have revealed that the light absorptive layer is formed on the n-site surface by the light irradiation. Photocatalysis reactions may play a very important role in the formation of the layer.","PeriodicalId":253421,"journal":{"name":"Semiconducting and Insulating Materials 1998. Proceedings of the 10th Conference on Semiconducting and Insulating Materials (SIMC-X) (Cat. No.98CH36159)","volume":"35 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1998-06-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Semiconducting and Insulating Materials 1998. Proceedings of the 10th Conference on Semiconducting and Insulating Materials (SIMC-X) (Cat. No.98CH36159)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/SIM.1998.785110","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
Formation of a light absorptive layer on the surface of a GaAlAs LED due to light irradiation has been studied by irradiating red, green light and infrared ray LEDs on a pellet of a GaAlAs device. The Auger electron spectroscopy depth profiles and electron probe micro analysis have revealed that the light absorptive layer is formed on the n-site surface by the light irradiation. Photocatalysis reactions may play a very important role in the formation of the layer.