A concept of ultraviolet lithography system and design of its rear part using artificial intelligence for starting design

Abstract

This paper describes a concept for designing a projection lens in lithographic optical system for 365 nm. Our approach for meeting this objective is to use the starting design obtained by artificial intelligence mode in Synopsys software. The proposed method describes the steps of getting a desired starting point of the optical system and the optimization problems in the optical system with a high numerical aperture.