Susceptibility of Group-IV and III-V Semiconductor-Based Electronics to Atmospheric Neutrons Explored by Geant4 Numerical Simulations

D. Munteanu, J. Autran
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引用次数: 10

Abstract

New semiconductor materials are envisaged in numerous high-performance applica- tions for which the expected device or circuit performances cannot be achieved with silicon. In this context of growing use of new and specific semiconductors, the question of their susceptibility to natural radiation, primarily to atmospheric neutrons, is posed for high-reliability-level application domains. This numerical simulation work precisely examines nuclear events resulting from the interaction of atmospheric neutrons at the terrestrial level with a target layer composed of various group-IV and III-V semicon- ductor materials including silicon, germanium, silicon carbide, carbon-diamond, gal lium arsenide, and gallium nitride materials. Using extensive Geant4 simulations and in-depth data analysis, this study provides an accurate and fine comparison between the neutron interaction responses of these different semiconductors in terms of nuclear processes, recoil products, secondary ion production, and fragment energy distributions. Implications of these results on the rate of single-event transient effects at the device or circuit level are also discussed. alpha particles, characterized by lower LET values but longer ranges in the different semicon ductor materials, are susceptible to induce single events farther from their emission point than heavy fragments up to distances of hundred microns for alpha particles and several millimeters for protons. Finally, the consequences of neutron interactions in the different targets in terms of electron–hole pair generation, a fundamental mechanism at the origin of single events in electronics, have been examined. Our results show that germanium cor responds to the worst case and diamond (also SiC) to the best case with regard to e–h pair production, Si, GaAs, and GaN being relatively equivalent and of intermediate behavior with respect to this criterion.
Geant4数值模拟研究了族iv和族III-V半导体电子器件对大气中子的敏感性
新的半导体材料被设想在许多高性能的应用中,预期的器件或电路性能不能用硅来实现。在越来越多地使用新型和特殊半导体的背景下,它们对自然辐射的敏感性问题,主要是对大气中子的敏感性问题,提出了高可靠性应用领域。这项数值模拟工作精确地检查了由大气中子与目标层相互作用引起的核事件,目标层由各种iv族和III-V族半导体材料组成,包括硅、锗、碳化硅、碳-金刚石、砷化镓和氮化镓材料。通过广泛的Geant4模拟和深入的数据分析,本研究从核过程、反冲产物、二次离子产生和碎片能量分布等方面对这些不同半导体的中子相互作用响应进行了准确而精细的比较。这些结果对器件或电路级单事件瞬态效应率的影响也进行了讨论。α粒子具有较低的LET值,但在不同的半导体材料中具有较长的范围,与重碎片相比,α粒子容易在距离其发射点较远的地方诱发单事件,距离可达数百微米,质子可达几毫米。最后,研究了中子相互作用在不同目标中的电子-空穴对产生的后果,这是电子学中单个事件起源的基本机制。我们的研究结果表明,在e-h对生产方面,锗响应最差情况,金刚石(也包括SiC)响应最佳情况,Si, GaAs和GaN相对等效,并且在此标准下具有中间行为。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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