Using a retro-reflecting echelle grating to improve WDM demux efficiency

1997 Digest of the IEEE/LEOS Summer Topical Meeting: Vertical-Cavity Lasers/Technologies for a Global Information Infrastructure/WDM Components Technology/Advanced Semiconductor Lasers and Application Pub Date : 1997-08-11 DOI:10.1109/LEOSST.1997.619187

L. Erickson, B. Lamontagne, J. He, A. Delâge, M. Davies, E. Koteles

引用次数: 6

Abstract

The use of uncoated facets on the echelle grating in a monolithic InP WDM demux leads to a reflection loss of 5.65 dB for an index of refraction of approximately 3.18. This loss can be largely eliminated by coating the out of plane facet with gold, but it involves another processing step. An alternative is to use total internal reflecting (retro-reflecting) facets. We have fabricated a WDM demultiplexer in InP for use at 1550 nm using an echelle with retro-reflecting facets and have compared its performance to another demux on the same wafer using an echelle with flat facets.

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利用反向反射梯形光栅提高波分复用效率

在单片InP WDM demux中，在梯级光栅上使用未涂覆的刻面导致折射率约为3.18的反射损失为5.65 dB。这种损失可以在很大程度上通过在面外表面涂上金来消除，但这涉及到另一个加工步骤。另一种选择是使用全内反射(反向反射)切面。我们已经在InP中制作了一个用于1550 nm的WDM解复用器，使用具有反向反射面的梯级，并将其性能与同一晶圆上使用具有平面的梯级的另一个demux进行了比较。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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来源期刊

1997 Digest of the IEEE/LEOS Summer Topical Meeting: Vertical-Cavity Lasers/Technologies for a Global Information Infrastructure/WDM Components Technology/Advanced Semiconductor Lasers and Application

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