Negative photoresists and integrated optics

J. Clair, J. Frejlich, J. Jonathan, L. Torres
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引用次数: 7

Abstract

Physicochemical treatments are proposed to optimize the properties of negative photoresists. These materials are used to realize phase filters and components for integrated optics.
负光刻胶和集成光学
提出了优化负光刻胶性能的物理化学处理方法。这些材料用于实现集成光学的相位滤波器和元件。
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