Structural Modification of Mo-Si X-Ray Multilayer Mirrors: Ion-Assisted Sputter Deposition

S. Vernon, D. Stearns, R. S. Rosen
{"title":"Structural Modification of Mo-Si X-Ray Multilayer Mirrors: Ion-Assisted Sputter Deposition","authors":"S. Vernon, D. Stearns, R. S. Rosen","doi":"10.1364/sxray.1992.tub3","DOIUrl":null,"url":null,"abstract":"The structural properties and soft x-ray normal incidence reflectivity of Mo-Si multilayers fabricated using ion-assisted dc magnetron sputter deposition are reported.","PeriodicalId":409291,"journal":{"name":"Soft-X-Ray Projection Lithography","volume":"1 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Soft-X-Ray Projection Lithography","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1364/sxray.1992.tub3","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1

Abstract

The structural properties and soft x-ray normal incidence reflectivity of Mo-Si multilayers fabricated using ion-assisted dc magnetron sputter deposition are reported.
Mo-Si x射线多层反射镜的结构修饰:离子辅助溅射沉积
报道了离子辅助直流磁控溅射法制备Mo-Si多层膜的结构特性和软x射线入射反射率。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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