Influence of the deposition conditions on the properties of TiO2 -Ge nanocomposite films synthesized by magnetron co-sputtering

A. Slav, G. Stan, A. Galca
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Abstract

A growing need for eco-friendly energy sources have led recently to a frantic search of new compositional systems for photovoltaic applications. The nanocomposite titania-germanium (TiO2-Ge) systems represent a new viable family of optoelectronic materials. Their structural, optical and electronic properties can be easily tailored by customizing the density and size of Ge dots in the TiO2 matrix. Early studies on TiO2-Ge nanocomposites have shown promises for their use as an alternative in photovoltaic applications. In this study we report the TiO2-Ge films synthesis by reactive magnetron co-sputtering. Their properties were evaluated by compositional (EDS), structural (XRD, FTIR) and optical (UV-Vis) characterizations.
沉积条件对磁控共溅射法制备TiO2 -Ge纳米复合薄膜性能的影响
对环保能源日益增长的需求导致了最近对光伏应用的新成分系统的疯狂搜索。纳米复合钛锗(TiO2-Ge)体系代表了一种新的可行的光电材料家族。通过定制TiO2基体中Ge点的密度和尺寸,可以轻松定制其结构、光学和电子特性。对二氧化钛-锗纳米复合材料的早期研究表明,它们有望作为光伏应用的替代品。本文报道了反应磁控共溅射法制备TiO2-Ge薄膜。通过成分(EDS)、结构(XRD、FTIR)和光学(UV-Vis)表征对其性能进行了评价。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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