Ju-Ho Son, Sun-Hong Kim, S. Choi, DoHwan Rho, Dong-Yong Kim
{"title":"Multilevel monolithic 3D inductors on silicon","authors":"Ju-Ho Son, Sun-Hong Kim, S. Choi, DoHwan Rho, Dong-Yong Kim","doi":"10.1109/MWSCAS.2001.986321","DOIUrl":null,"url":null,"abstract":"This paper has been the analysis of passive devices in Si RF and microwave. Multilevel monolithic 3D inductors implemented in a standard CMOS technology are presented. Since on-chip inductors are constrained to be planar, the typical solution is to form a spiral. Proposed inductors are composed of 3D structures requiring no extra processing steps. Inductances are higher in increasing the mutual inductance besides the self-inductance. In this reason, this structure gives rise to a quality factor Q and a inductance using 3D geometry in small areas.","PeriodicalId":403026,"journal":{"name":"Proceedings of the 44th IEEE 2001 Midwest Symposium on Circuits and Systems. MWSCAS 2001 (Cat. No.01CH37257)","volume":"93 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2001-08-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"5","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings of the 44th IEEE 2001 Midwest Symposium on Circuits and Systems. MWSCAS 2001 (Cat. No.01CH37257)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/MWSCAS.2001.986321","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 5
Abstract
This paper has been the analysis of passive devices in Si RF and microwave. Multilevel monolithic 3D inductors implemented in a standard CMOS technology are presented. Since on-chip inductors are constrained to be planar, the typical solution is to form a spiral. Proposed inductors are composed of 3D structures requiring no extra processing steps. Inductances are higher in increasing the mutual inductance besides the self-inductance. In this reason, this structure gives rise to a quality factor Q and a inductance using 3D geometry in small areas.