CFD study of flow boiling in silicon microgaps with staggered pin fins for the 3D-stacking of ICs

D. Lorenzini, Y. Joshi
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引用次数: 6

Abstract

Flow boiling in surface-enhanced microgaps represents a promising thermal control method for the removal of relatively high heat fluxes in applications such as three-dimensional (3D) integration of microelectronics. Although a few experimental investigations have reported encouraging results for these types of cooling layers, the computational fluid dynamics (CFD) analysis of the involved physics has lagged behind due to a number of challenges. In the present study, a phase-change model is used with the Volume of Fluid (VOF) method for interface tracking to analyze the transient flow regime evolution due to boiling in a microgap with circular pin fins for area enhancement, where the simultaneous heat conduction is solved in the silicon medium. High-Performance Computing (HPC) is used for investigating two-phase flow and heat transfer in a relatively dense array of pin fins of 150 μm diameter populating a 175 μm height microgap, which is 10 mm long. The dielectric refrigerant R245fa is used as the coolant due to its negligible electrical conductivity, desirable for inter-tier cooling. Results provide useful insight on how the vapor phase is generated and distributed as a function of the axial direction, as well as the implication on heat transfer and resulting surface temperatures to identify trends and required conditions for the reliable operation in potential microelectronic applications.
交错针翅硅微隙内流动沸腾的CFD研究
在三维(3D)微电子集成等应用中,表面增强微隙中的流动沸腾代表了一种有前途的热控制方法,用于去除相对高的热流通量。尽管一些实验研究报告了这些类型的冷却层令人鼓舞的结果,但由于许多挑战,所涉及的物理计算流体动力学(CFD)分析滞后。在本研究中,采用相变模型和流体体积法(VOF)进行界面跟踪,分析了在硅介质中同时热传导的圆形针翅微隙中沸腾引起的瞬态流态演变。采用高性能计算(HPC)研究了直径为150 μm、高175 μm、长10 mm的微间隙内相对密集的引脚鳍阵列中的两相流动和传热。采用介电制冷剂R245fa作为冷却剂,因为其导电性可忽略不计,适合层间冷却。结果提供了关于气相如何产生和分布作为轴向的函数的有用见解,以及对传热和由此产生的表面温度的含义,以确定在潜在的微电子应用中可靠运行的趋势和所需条件。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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