Influence of Interconnect Parasitics on the Lateral Scaling of SiGe Power HBTs

Guogong Wang, Hao-Chih Yuan, Z. Ma
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Abstract

The influence of interconnect parasitics on the lateral scaling of emitter stripe width of large-area SiGe power heterojunction bipolar transistors (HBTs) are analytically studied and experimentally verified. It is found that, due to the increased parasitics along with the increase of device area, the maximum oscillation frequency (fmax ) of a power SiGe HBT cannot be improved monotonically with the shrinking of the emitter stripe width, which is different from the downscaling of the low-power (few emitter stripes) counterparts. Instead, the emitter stripe width of large-area devices ought to be appropriately up-scaled, relative to that of low-power devices, in order to optimize the RF performance of large-area SiGe power HBTs. It is also found that the influences of interconnect parasitics on the fmax and the power gain (Gmax) for common-emitter (CE) and for common-base (CB) SiGe power HBTs are different
互连寄生对SiGe功率HBTs横向缩放的影响
分析研究了互连寄生对大面积SiGe功率异质结双极晶体管发射极条纹宽度横向缩放的影响,并进行了实验验证。研究发现,由于寄生效应随着器件面积的增加而增加,功率SiGe HBT的最大振荡频率(fmax)不能随着发射极条纹宽度的减小而单调提高,这与低功率(发射极条纹较少)的HBT不同。相反,相对于低功率器件,大面积器件的发射极条纹宽度应该适当放大,以优化大面积SiGe功率hbt的射频性能。研究还发现,对于共发射极(CE)和共基极(CB) SiGe功率hbt,互连寄生对fmax和功率增益(Gmax)的影响是不同的
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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