Thermal techniques to improve ZnO-based FBAR devices characteristics

Linh Mai, Ngoc-Hung Do, T. Hoang, Van-Su Tran, Lan-Phuong Bui Pham, T. Nguyen Thi, Hung Ngoc Le
{"title":"Thermal techniques to improve ZnO-based FBAR devices characteristics","authors":"Linh Mai, Ngoc-Hung Do, T. Hoang, Van-Su Tran, Lan-Phuong Bui Pham, T. Nguyen Thi, Hung Ngoc Le","doi":"10.1109/ATC.2009.5349577","DOIUrl":null,"url":null,"abstract":"The paper presents some methods to improve characteristics of film bulk acoustic resonator (FBAR) devices. The FBAR devices were fabricated on Bragg reflectors. Thermal treatments were done by sintering and/or annealing processes. The measurement showed a considerable improvement of return loss (S11) and quality factor (Qs/p). These thermal treatment techniques seem very promising for enhancing FBAR resonance performance.","PeriodicalId":311235,"journal":{"name":"2009 International Conference on Advanced Technologies for Communications","volume":"36 4 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2009-12-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2009 International Conference on Advanced Technologies for Communications","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ATC.2009.5349577","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
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Abstract

The paper presents some methods to improve characteristics of film bulk acoustic resonator (FBAR) devices. The FBAR devices were fabricated on Bragg reflectors. Thermal treatments were done by sintering and/or annealing processes. The measurement showed a considerable improvement of return loss (S11) and quality factor (Qs/p). These thermal treatment techniques seem very promising for enhancing FBAR resonance performance.
提高zno基FBAR器件特性的热技术
本文介绍了提高薄膜体声谐振器(FBAR)器件性能的几种方法。FBAR器件是在布拉格反射器上制备的。热处理是通过烧结和/或退火工艺进行的。测量结果表明,回波损耗(S11)和质量因子(Qs/p)有了相当大的改善。这些热处理技术在提高FBAR谐振性能方面非常有前景。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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