Surface morphology of LPE-growth GaSb quantum dots

Yang Wang, Shuhong Hu, Y. Lv, N. Dai
{"title":"Surface morphology of LPE-growth GaSb quantum dots","authors":"Yang Wang, Shuhong Hu, Y. Lv, N. Dai","doi":"10.1117/12.2182638","DOIUrl":null,"url":null,"abstract":"The self-assembled type-II GaSb quantum dots (QDs) were successfully grown on semi-insulting GaAs (100) substrate by the liquid phase epitaxy (LPE) technique with growth temperature ranging from 520 to 580 oC. The morphology of GaSb QDs including size, shape and density was investigated by atomic force microscopy measurement and scanning electron microscope measurement, respectively. The cap layer with scores of nanometers, which is characterized by Profile-system, is obtained for the photoluminescence measurement and device fabrication.","PeriodicalId":225534,"journal":{"name":"Photoelectronic Technology Committee Conferences","volume":"327 3-4","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2015-04-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Photoelectronic Technology Committee Conferences","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1117/12.2182638","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
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Abstract

The self-assembled type-II GaSb quantum dots (QDs) were successfully grown on semi-insulting GaAs (100) substrate by the liquid phase epitaxy (LPE) technique with growth temperature ranging from 520 to 580 oC. The morphology of GaSb QDs including size, shape and density was investigated by atomic force microscopy measurement and scanning electron microscope measurement, respectively. The cap layer with scores of nanometers, which is characterized by Profile-system, is obtained for the photoluminescence measurement and device fabrication.
lpe生长的GaSb量子点的表面形貌
采用液相外延(LPE)技术在半绝缘GaAs(100)衬底上成功生长出了自组装ii型GaSb量子点(QDs),生长温度为520 ~ 580℃。采用原子力显微镜和扫描电镜分别对GaSb量子点的大小、形状和密度等形貌进行了研究。得到了用于光致发光测量和器件制作的具有轮廓系统特征的纳米级帽层。
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