H. Saito, T. Sugimachi, Ko Nakamura, S. Ozawa, N. Sashida, S. Mihara, Y. Hikosaka, Wensheng Wang, Tomoyuki Hori, K. Takai, M. Nakazawa, N. Kosugi, M. Okuda, M. Hamada, S. Kawashima, T. Eshita, M. Matsumiya
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引用次数: 3
Abstract
We have developed a ferroelectric RAM (FRAM) with a low operation voltage of 1.2 V and a high switching endurance up to 1017 cycles. Our newly developed triple-protection structured cell array, has constructed without an additional mask step, effectively protects 0.4-μm2 ferroelectric capacitors from hydrogen and moisture degradation. We have designed our capacitor-over-bit-line (COB) structure to have a small cell size of 0.5 μm2.
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