Carrier and refractive index dynamics in core-shell nanolasers grown on silicon during spontaneous and stimulated emission

T. Ochalski, Juan S. D. Morales, S. Gandan, D. Huffaker, Hyunseok Kim, L. O’Faolain
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Abstract

In this work, we experimentally study the carrier and refractive index dynamics of InGaAs nanopillar grown on a Si on insulator (SOI) substrate. The recombination process of the InGaAs NP is characterized with different optical techniques. Temperature dependent photoluminescence (PL) at 0.5mW excitation power is carried out to determine the influence of temperature on carrier dynamics. The radiative recombination lifetime has been studied at 7K from time-resolved photoluminescence (TRPL) experiments at a certain excitation power. The optimal combination of pitch (separation between NPs) and diameter in the growth process of this nanostructure has also been measured. These results will contribute to further optimization of the InGaAs nanolaser for integration of III-V optoelectronics on SOI substrates.
在硅上生长的核壳纳米激光器在自发和受激发射中的载流子和折射率动力学
在本工作中,我们实验研究了生长在硅绝缘体(SOI)衬底上的InGaAs纳米柱的载流子和折射率动力学。采用不同的光学技术对InGaAs NP的复合过程进行了表征。为了确定温度对载流子动力学的影响,在0.5mW激发功率下进行了温度依赖光致发光(PL)实验。利用时间分辨光致发光(TRPL)实验研究了在一定激发功率下7K时的辐射复合寿命。还测量了该纳米结构生长过程中间距(NPs之间的间距)和直径的最佳组合。这些结果将有助于进一步优化用于在SOI衬底上集成III-V光电子器件的InGaAs纳米激光器。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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