High sensitivity ultra-violet photosensor based on nanostructured Nb2O5

Abstract

This work reports the characterization of UV sensor based on nanomoss Nb2O5 films. Nb2O5 has been synthesized by hydrothermal etching reaction of niobium foil in fluoride ion based solution. The morphological and structural of nanomoss Nb2O5 are investigated using FESEM and XRD techniques to determine the properties of the film. From UV characterization, the UV sensor has exhibited good photosensitivity of 2.0 when exposed under turn on/off of UV light.This work reports the characterization of UV sensor based on nanomoss Nb2O5 films. Nb2O5 has been synthesized by hydrothermal etching reaction of niobium foil in fluoride ion based solution. The morphological and structural of nanomoss Nb2O5 are investigated using FESEM and XRD techniques to determine the properties of the film. From UV characterization, the UV sensor has exhibited good photosensitivity of 2.0 when exposed under turn on/off of UV light.