New Magnetic Multilayer for a Direct On-chip EMI Shielding Layer on a Mold Substrate in the sub-100 MHz Frequency Range

A. Kikitsu, Y. Kurosaki, S. Shirotori, A. Fujita, H. Nishigaki, S. Matsunaka
{"title":"New Magnetic Multilayer for a Direct On-chip EMI Shielding Layer on a Mold Substrate in the sub-100 MHz Frequency Range","authors":"A. Kikitsu, Y. Kurosaki, S. Shirotori, A. Fujita, H. Nishigaki, S. Matsunaka","doi":"10.1109/intermag39746.2022.9827778","DOIUrl":null,"url":null,"abstract":"A new type of metallic/magnetic multilayer system was investigated as a direct on-chip electromagnetic interference (EMI) shielding layer for the sub-100 MHz frequency range. It was found that a multilayer of [Cu (100 nm)/Ni-Fe-Cu-Mo (NFCM) (100 nm)]10/[Ta (5 nm)/NFCM (50 nm)]55/[Ta (5 nm)/NFCM (300 nm)]10 exhibited a high shielding effect at around 50 MHz for both glass and mold substrates. This structure also exhibited a better shielding effect at 170 kHz than the conventional magnetic shielding. These results are due to magneto-static interactions between multilayer units, which was evidenced by a hysteresis loop typical for a single-layer soft magnetic film. It is suggested that the coupling reduces the energy of the domain wall resonance and shifts the resonance peak to lower frequency. It was also found that substitution of CrTi layer for the Ta layer further improved the shielding effect in the lower frequency region. This multilayer system is a promising candidate for the direct-on-chip shielding layer covering the kHz to sub-100 MHz frequency range, which is suitable for application in power modules used for mobile devices and electric vehicles.","PeriodicalId":135715,"journal":{"name":"2022 Joint MMM-Intermag Conference (INTERMAG)","volume":"75 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2022-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2022 Joint MMM-Intermag Conference (INTERMAG)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/intermag39746.2022.9827778","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1

Abstract

A new type of metallic/magnetic multilayer system was investigated as a direct on-chip electromagnetic interference (EMI) shielding layer for the sub-100 MHz frequency range. It was found that a multilayer of [Cu (100 nm)/Ni-Fe-Cu-Mo (NFCM) (100 nm)]10/[Ta (5 nm)/NFCM (50 nm)]55/[Ta (5 nm)/NFCM (300 nm)]10 exhibited a high shielding effect at around 50 MHz for both glass and mold substrates. This structure also exhibited a better shielding effect at 170 kHz than the conventional magnetic shielding. These results are due to magneto-static interactions between multilayer units, which was evidenced by a hysteresis loop typical for a single-layer soft magnetic film. It is suggested that the coupling reduces the energy of the domain wall resonance and shifts the resonance peak to lower frequency. It was also found that substitution of CrTi layer for the Ta layer further improved the shielding effect in the lower frequency region. This multilayer system is a promising candidate for the direct-on-chip shielding layer covering the kHz to sub-100 MHz frequency range, which is suitable for application in power modules used for mobile devices and electric vehicles.
在低于100 MHz的频率范围内,用于模具基板上直接片上EMI屏蔽层的新型磁性多层膜
研究了一种新型的金属/磁性多层体系作为片上电磁干扰屏蔽层,用于sub- 100mhz频率范围。研究发现,[Cu (100 nm)/Ni-Fe-Cu-Mo (NFCM) (100 nm)]10/[Ta (5 nm)/NFCM (50 nm)]55/[Ta (5 nm)/NFCM (300 nm)]10多层膜在50 MHz左右对玻璃基片和模具基片都表现出较高的屏蔽效果。该结构在170 kHz时也表现出比传统磁屏蔽更好的屏蔽效果。这些结果是由于多层单元之间的静磁相互作用,单层软磁膜典型的磁滞回线证明了这一点。结果表明,这种耦合降低了畴壁共振的能量,使共振峰向低频偏移。用CrTi层代替Ta层进一步改善了低频区的屏蔽效果。该多层系统是覆盖kHz至sub-100 MHz频率范围的直接片上屏蔽层的理想选择,适用于移动设备和电动汽车的功率模块。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 求助全文
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信