Sub-ps 1030 nm laser-induced damage threshold evaluation of pulsed-laser deposited sesquioxides and magnetron-sputtered metal oxide optical coatings

Abstract

Crystalline sesquioxide films (Sc2O3, Y2O3, Lu2O3) produced by pulsed-laser deposition were examined for laser damage resistance with pulses of 500 fs duration, at a wavelength of 1030 nm and at a 10 Hz repetition rate. Comparable tests were performed with amorphous magnetron-sputtered thin films (SiO2, HfO2, Nb2O5). We found the laser-induced damage thresholds of the sesquioxides are close to those of HfO2 in the multi-pulse test regime. The results are the basis for designs of damage resistant re ective components used in ultrashort-pulse lasers.