Electron Distribution in Non-uniformly Doped NPN Transistors

N. Syed, Rummana Bari, Tanjib Rubaiyat, Shahanara Akter, M. Asif-Ul-Hoque
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Abstract

In this paper the analytical expressions of minority carrier distribution for Exponential and Gaussian doped base within the n-p-n bipolar transistors are obtained. The derivation of model equations starts by first considering low level of minority carrier injection within the base. A minority carrier profile is obtained by solving electric field equation and current equations for holes and electrons at equilibrium. Next a first order differential equation is obtained for minority carrier distribution. The solution of the differential equation gives the minority carrier profile. In this paper characteristics of the derived equations of minority carrier distribution are studied with the variation of different parameters with reliability. The analytical model is justified by using a simple TCAD simulation.
非均匀掺杂NPN晶体管中的电子分布
本文得到了n-p-n双极晶体管中指数型和高斯型掺杂基极的少数载流子分布的解析表达式。模型方程的推导首先考虑基内少量载流子注入的低水平。通过求解空穴和电子在平衡状态下的电场方程和电流方程,得到了少数载流子分布。其次,得到了少数载流子分布的一阶微分方程。微分方程的解给出了少数载流子分布。本文研究了少数载流子分布导出方程在不同参数随可靠性变化的情况下的特性。通过简单的TCAD仿真验证了分析模型的正确性。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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