Y. Yamada, H. Kuroda, H. Izumi, T. Soezima, H. Wakamatsu, S. Hori
{"title":"X and Ku band high power GaAs FETs","authors":"Y. Yamada, H. Kuroda, H. Izumi, T. Soezima, H. Wakamatsu, S. Hori","doi":"10.1109/MWSYM.1988.22165","DOIUrl":null,"url":null,"abstract":"Internally matched GaAs FETs, with output powers of more than 10 W have been developed for the 10.7-11.7- and 14.0-14.5-GHz bands. These devices, with a total gate width of 32 mm, consist of two chips that are fabricated by direct ion implantation and chemical dry etching. At 14.25 GHz, the Ku-band device has achieved an output power of 41 dBm, a power gain of 5 dB and a power-added efficiency of 21%. At 11.2 GHz, the X-band device has delivered 41.2 dBm, 5.8 dB and 25%, respectively, at the 1-dB gain compression point.<<ETX>>","PeriodicalId":339513,"journal":{"name":"1988., IEEE MTT-S International Microwave Symposium Digest","volume":"1 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1988-05-25","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"9","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"1988., IEEE MTT-S International Microwave Symposium Digest","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/MWSYM.1988.22165","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 9
Abstract
Internally matched GaAs FETs, with output powers of more than 10 W have been developed for the 10.7-11.7- and 14.0-14.5-GHz bands. These devices, with a total gate width of 32 mm, consist of two chips that are fabricated by direct ion implantation and chemical dry etching. At 14.25 GHz, the Ku-band device has achieved an output power of 41 dBm, a power gain of 5 dB and a power-added efficiency of 21%. At 11.2 GHz, the X-band device has delivered 41.2 dBm, 5.8 dB and 25%, respectively, at the 1-dB gain compression point.<>