Template-Assisted Selective Epitaxy of InAs on W

J. Svensson, P. Olausson, H. Menon, E. Lind, M. Borg
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Abstract

Results on integration of InAs on W films through template assisted selective epitaxy are presented. The InAs crystals are analysed using SEM, electron beam backscattering and in-situ electrical measurements. A high yield of single crystalline InAs can be obtained for certain template diameters and pitches which demonstrates that this is a viable route to integrate III-V semiconductors in the back-end-of-line of CMOS circuits for added functionality.
模板辅助下铟酸钠在W上的选择性外延
介绍了模板辅助选择性外延技术在W薄膜上集成InAs的研究结果。利用扫描电镜、电子束后向散射和原位电测量对InAs晶体进行了分析。对于特定直径和节距的模板,可以获得高产量的单晶InAs,这表明这是将III-V半导体集成到CMOS电路后端以增加功能的可行途径。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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