Low current wideband amplifier using 0.2 /spl mu/m gate MODFET fabricated by using phase-shift lithography

I. Ishida, K. Miyatsuji, T. Tanaka, H. Takenaka, H. Furukawa, M. Nishitsuji, A. Tamura, D. Ueda
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引用次数: 1

Abstract

We have developed wideband amplifier that can keep over 10 dB gain at the drain voltage/current of 2 V/10 mA in the frequency range from 100 MHz to 3 GHz. The fabricated IC achieved low noise figure and high IP3 (output) of 1.4 dB and 30 dBm at 800 MHz, respectively. The present IC employs 0.2 /spl mu/m gate delta-doped MODFET structure fabricated by using phase-shift lithography.
采用移相光刻技术制作0.2 /spl μ m栅极MODFET的低电流宽带放大器
我们开发了一种宽带放大器,可以在100 MHz至3 GHz的频率范围内,在2 V/10 mA的漏极电压/电流下保持10 dB以上的增益。该集成电路在800 MHz时的低噪声系数和高IP3(输出)分别为1.4 dB和30 dBm。本集成电路采用移相光刻技术制备0.2 /spl μ m栅极掺杂MODFET结构。
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